10 µm process
(Redirected from 10 μm process)
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The 10 μm process (10 micrometer process) is the level of MOSFET semiconductor process technology that was commercially reached around 1971,[1][2] by companies such as RCA and Intel.
The 10 μm process refers to the minimum size that could be reliably produced: the half-pitch, which is the distance between two 1-metal lanes, center to center, and the gate length of a transistor; those two values used to be identical in early nodes. The smallest transistors and other circuit elements on a chip made with this process were around 10 micrometers wide.
Products featuring 10 μm manufacturing process
[edit | edit source]- RCA's CD4000 series of integrated circuits began with a 20 μm process in 1968, before gradually downscaling and eventually reaching 10 μm in the next several years.[3]
- Intel 1103, an early dynamic random-access memory (DRAM) chip launched in 1970, used an 8 μm process.[4]
- Intel 4004 CPU launched in 1971 was manufactured using a 10 μm process.[5]
- Intel 8008 CPU launched in 1972 was manufactured using this process.[5]
References
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External links
[edit | edit source]| Preceded by 20 μm process |
MOSFET semiconductor device fabrication process | Succeeded by 6 μm process |
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