Thin Solid Films
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| File:Thin Solid Films cover image.gif | |
| Discipline | Thin-film synthesis, applied physics |
|---|---|
| Language | English |
| Edited by | J. E. Greene |
| Publication details | |
Former name | Symposium on Plasma Science for Materials |
| History | 1967–present |
| Publisher | |
| Frequency | Biweekly |
| 2.183 (2020) | |
| Standard abbreviations | |
| ISO 4 | Thin Solid Films |
| Indexing | |
| CODEN | THSFAP |
| ISSN | 0040-6090 |
| LCCN | 81005059 |
| OCLC no. | 1605925 |
| Links | |
Thin Solid Films is a peer-reviewed scientific journal published 24 times per year by Elsevier. It was established in July 1967. The current editor-in-chief is J. E. Greene (University of Illinois at Urbana–Champaign).
Aims and scope
[edit | edit source]The journal covers research on thin-film synthesis, characterization, and applications, including synthesis, surfaces, interfaces, colloidal behavior, metallurgical topics, mechanics (including nanomechanics), electronics, optics, optoelectronics, magnetics, magneto-optics, and superconductivity.
Abstracting and indexing
[edit | edit source]The journal is indexed and abstracted in:
- Cambridge Scientific Abstracts
- Chemical Abstracts
- Chemical Abstracts Service
- Current Contents/Engineering, Computing & Technology
- Current Contents/Physical, Chemical & Earth Sciences
- Engineering Index
- Inspec
- Metals Abstracts
- PASCAL
- Physikalische Berichte
- Science Citation Index
- Scopus
According to the Journal Citation Reports, the journal has a 2020 impact factor of 2.183.[1]
References
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