Plasma processing
Jump to navigation
Jump to search
This article needs additional citations for verification. (September 2022) |
Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.[1]
Plasma processing techniques include:
- Plasma activation
- Plasma ashing
- Plasma cleaning
- Plasma electrolytic oxidation
- Plasma etching
- Plasma functionalization
- Plasma polymerization
- Corona treatment
- Plasma modification
Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching.
References
[edit | edit source]- ^ Lua error in Module:Citation/CS1/Configuration at line 2172: attempt to index field '?' (a nil value).