File:Charge-state model of VRT diagram.svg

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Summary

Description
English: Diagram of a Mosfet zooming on the gate drain overlap region, highlighting the interaction between a defect located in the gate oxide with a defect at the SI/SiO2 interface also called interface state.
Date
Source

Mechanism of random telegraph noise in junction leakage current of metal-oxide semiconductor

field-effect transistor, Journal of Applied Physics 111, 104513 (2012); doi: 10.1063/1.4721658
Author Yuki Mori, et al.

Licensing

Public domain This image of simple geometry is ineligible for copyright and therefore in the public domain, because it consists entirely of information that is common property and contains no original authorship.
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Captions

Trapped charge in the gate oxide can modulate interface state leakage current

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29 May 2012

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102,424 byte

f731e0a84a2f4cd2bf03177ccf34f3bd2e991a94

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