File:CBE im1.png
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| Description |
Basic processes inside the growth chambers of a) MOCVD, b) MBE, and c) CBE. W.T. Tsang, “From Chemical Vapor Epitaxy to Chemical Beam Epitaxy”. J. Cryst. Growth. 95, 121 (1989). |
|---|---|
| Source |
Own work |
| Date |
05 December 2007 |
| Author | |
| Permission (Reusing this file) |
See below.
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Summary
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Basic processes inside the growth chambers of a) MOCVD, b) MBE, and c) CBE. W.T. Tsang, “From Chemical Vapor Epitaxy to Chemical Beam Epitaxy”. J. Cryst. Growth. 95, 121 (1989).
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